| سال | هفته | ID | Title | ApplNo | IPC | Applicant | Subgroup | زیر گروه | رشته | شرح | Description |
|---|
2026 | 05 | WO/2026/021666 | TDI CAMERA SYNCHRONIZATION FOR MASK INSPECTION SYSTEM | EP2024/070960 | G03F 1/84 | CARL ZEISS SMT GMBH | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/021719 | METHOD OF DETERMINING DEGRADATION ON A FIDUCIAL | EP2025/064564 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/021790 | MODULAR MOVEABLE LOADING STATION FOR A LITHOGRAPHY APPARATUS | EP2025/068409 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/021792 | OPTIMIZING A PATTERNING DEVICE LAYOUT AND A DISCRETIZED PUPIL PROFILE TO CONTROL FACET MIRRORS USED IN A LITHOGRAPHIC PROCESS | EP2025/068425 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/021820 | OPTICAL MEMBER THERMAL CONDITIONING METHOD | EP2025/069003 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/021823 | OBJECT FORCE APPLICATION SYSTEM | EP2025/069032 | G03F 7/00 | ASML NETHERLANDS B.V. | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/022066 | WORKPIECE FOR A SEMICONDUCTOR TECHNOLOGY SYSTEM, SYSTEM FOR SEMICONDUCTOR TECHNOLOGY, METHOD FOR PRODUCING A WORKPIECE | EP2025/070811 | G03F 7/20 | CARL ZEISS SMT GMBH | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/022148 | DEVICE FOR PIVOTING AN OPTICAL COMPONENT INTO A BEAM PATH OF A SYSTEM FOR SEMICONDUCTOR TECHNOLOGY, AND SYSTEM FOR SEMICONDUCTOR TECHNOLOGY | EP2025/070992 | G03F 7/00 | CARL ZEISS SMT GMBH | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/022360 | APPARATUS FOR INSPECTING AN OBJECT PERTAINING TO EUV SEMICONDUCTOR TECHNOLOGY | EP2025/071495 | G03F 1/84 | CARL ZEISS SMT GMBH | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/022983 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED CIRCUIT BOARD | JP2024/026514 | G03F 7/004 | RESONAC CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/023353 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, MONOMER, AND METHOD FOR SYNTHESIZING MONOMER | JP2025/023630 | G03F 7/039 | JSR CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/023380 | RESIN MASK RELEASE AGENT COMPOSITION | JP2025/024178 | G03F 7/42 | KAO CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/023561 | METHOD FOR FORMING WIRING GROOVE AND VIA HOLE OF DUAL DAMASCENE STRUCTURE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | JP2025/025705 | G03F 7/40 | CANON KABUSHIKI KAISHA | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/023597 | COMPOSITION FOR FORMING PROTECTIVE FILM, PROTECTIVE FILM, METHOD FOR MANUFACTURING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | JP2025/025866 | G03F 7/11 | NISSAN CHEMICAL CORPORATION | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/023645 | PHOTOSENSITIVE RESIN LAMINATE | JP2025/026117 | G03F 7/027 | ASAHI KASEI KABUSHIKI KAISHA | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/023916 | PRECURSOR COMPOUND, COMPOSITION PREPARED THEREFROM, AND METHOD FOR FORMING THIN FILM COMPRISING SAME | KR2025/009502 | G03F 7/004 | DONGJIN SEMICHEM CO., LTD. | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/024423 | PITCH SPLITTING FOR EUV IMAGING | US2025/035779 | G03F 7/00 | TOKYO ELECTRON LIMITED | PHYSICS | فیزیک | ابزارها | 2026 | 05 | WO/2026/024517 | PINHOLE PROBABILITY ANALYSIS METHODS FOR PHOTORESIST FILMS | US2025/037860 | G03F 7/00 | LAM RESEARCH CORPORATION | PHYSICS | فیزیک | ابزارها |